An image sensor for wide dynamic range by adapting integration time of each pixel is proposed. The integration time of each pixel is selected among several lengths of integration time and the ...

Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

The part 4 of this article series looked at the operation of the 3T and 5T charge-transfer pixels in some detail. The characteristics of the pixel were examined during reset and charge integration. We ...